Skip to content
About us
Elettrorava History
Research projects
Technologies
PVD process
Thermal Evaporation – TE
Electron Beam Evaporation – EBPVD
Sputtering process
Magnetron Sputtering – MS
Ion Beam Sputtering – IBS
Ion Beam Assisted Deposition – IBAD
CVD process
Thermal Low Pressure CVD – LPCVD
Metalorganic Chemical Vapor Deposition – MOCVD
Atomic Layer Deposition – ALD
Plasma Enhanced CVD – PECVD
Inductively Coupled Plasma CVD – ICPCVD
Etching process
Reactive Ion Etching – RIE
Inductive Coupled Plasma RIE – ICPRIE
Ion Beam Etching – IBE
Contact us
Toggle website search
Menu
Close
About us
Elettrorava History
Research projects
Technologies
PVD process
Thermal Evaporation – TE
Electron Beam Evaporation – EBPVD
Sputtering process
Magnetron Sputtering – MS
Ion Beam Sputtering – IBS
Ion Beam Assisted Deposition – IBAD
CVD process
Thermal Low Pressure CVD – LPCVD
Metalorganic Chemical Vapor Deposition – MOCVD
Atomic Layer Deposition – ALD
Plasma Enhanced CVD – PECVD
Inductively Coupled Plasma CVD – ICPCVD
Etching process
Reactive Ion Etching – RIE
Inductive Coupled Plasma RIE – ICPRIE
Ion Beam Etching – IBE
Contact us
Toggle website search
Technologies
Home
>
Technologies
